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Growth Characteristics, Phase Composition, and Optical Properties of Ti–Sc–O Thin Films Synthesized by Atomic Layer Deposition Full article

Journal Russian Journal of Inorganic Chemistry
ISSN: 0036-0236 , E-ISSN: 1531-8613
Output data Year: 2025, Volume: 70, Number: 9, Pages: 1379-1390 Pages count : 12 DOI: 10.1134/S0036023625602752
Tags atomic layer deposition, thin films, ellipsometry, X-ray diffraction, X-ray photoelectron spectroscopy
Authors Petukhova D.E. 1 , Korolkov I.V. 1 , Saraev A.A. 2 , Lebedev M.S. 1
Affiliations
1 Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, Novosibirsk, 630090 Russia
2 Boreskov Institute of Catalysis, Siberian Branch of the Russian Academy of Sciences, Novosibirsk, 630090 Russia
Cite: Petukhova D.E. , Korolkov I.V. , Saraev A.A. , Lebedev M.S.
Growth Characteristics, Phase Composition, and Optical Properties of Ti–Sc–O Thin Films Synthesized by Atomic Layer Deposition
Russian Journal of Inorganic Chemistry. 2025. V.70. N9. P.1379-1390. DOI: 10.1134/S0036023625602752
Dates:
Submitted: Mar 28, 2025
Accepted: Jun 11, 2025
Published print: Sep 30, 2025
Identifiers: No identifiers
Citing: Пока нет цитирований
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