Growth Characteristics, Phase Composition, and Optical Properties of Ti–Sc–O Thin Films Synthesized by Atomic Layer Deposition Научная публикация

Журнал	Russian Journal of Inorganic Chemistry ISSN: 0036-0236 , E-ISSN: 1531-8613
Вых. Данные	Год: 2025, Том: 70, Номер: 9, Страницы: 1379-1390 Страниц : 12 DOI: 10.1134/S0036023625602752
Ключевые слова	atomic layer deposition, thin films, ellipsometry, X-ray diffraction, X-ray photoelectron spectroscopy
Авторы	Petukhova D.E. 1 , Korolkov I.V. 1 , Saraev A.A. 2 , Lebedev M.S. 1
Организации	1 Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, Novosibirsk, 630090 Russia 2 Boreskov Institute of Catalysis, Siberian Branch of the Russian Academy of Sciences, Novosibirsk, 630090 Russia