Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering

Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering Научная публикация

Журнал

Coatings
ISSN: 2079-6412

Вых. Данные

Год: 2023, Том: 13, Номер: 7, Номер статьи : 1281, Страниц : 13 DOI: 10.3390/coatings13071281

Авторы

Shayapov Vladimir R. ^1,2 , Bogoslovtseva Alena L. ¹ , Chepkasov Sergey Yu. ¹ , Asanov Igor P. ^1,2 , Maksimovskiy Evgeny A. ^1,2 , Kapishnikov Aleksandr V. ¹ , Mironova Maria I. ¹ , Lapega Alina V. ¹ , Geydt Pavel V. ¹

Организации

1	Laboratory of Functional Diagnostics of Low–Dimensional Structures for Nanoelectronics, Novosibirsk State University, 630090 Novosibirsk, Russia
2	Nikolaev Institute of Inorganic Chemistry, SB RAS, 630090 Novosibirsk, Russia

Shayapov V.R. , Bogoslovtseva A.L. , Chepkasov S.Y. , Asanov I.P. , Maksimovskiy E.A. , Kapishnikov A.V. , Mironova M.I. , Lapega A.V. , Geydt P.V.
Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering
Coatings. 2023. V.13. N7. 1281 :1-13. DOI: 10.3390/coatings13071281 WOS Scopus OpenAlex

Поступила в редакцию:	23 июн. 2023 г.
Опубликована в печати:	21 июл. 2023 г.

Web of science:	WOS:001035225500001
Scopus:	2-s2.0-85166261172
OpenAlex:	W4385224121

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