Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering

Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering Full article

Journal

Coatings
ISSN: 2079-6412

Output data

Year: 2023, Volume: 13, Number: 7, Article number : 1281, Pages count : 13 DOI: 10.3390/coatings13071281

Authors

Shayapov Vladimir R. ^1,2 , Bogoslovtseva Alena L. ¹ , Chepkasov Sergey Yu. ¹ , Asanov Igor P. ^1,2 , Maksimovskiy Evgeny A. ^1,2 , Kapishnikov Aleksandr V. ¹ , Mironova Maria I. ¹ , Lapega Alina V. ¹ , Geydt Pavel V. ¹

Affiliations

1	Laboratory of Functional Diagnostics of Low–Dimensional Structures for Nanoelectronics, Novosibirsk State University, 630090 Novosibirsk, Russia
2	Nikolaev Institute of Inorganic Chemistry, SB RAS, 630090 Novosibirsk, Russia

Shayapov V.R. , Bogoslovtseva A.L. , Chepkasov S.Y. , Asanov I.P. , Maksimovskiy E.A. , Kapishnikov A.V. , Mironova M.I. , Lapega A.V. , Geydt P.V.
Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering
Coatings. 2023. V.13. N7. 1281 :1-13. DOI: 10.3390/coatings13071281 WOS Scopus OpenAlex

Submitted:	Jun 23, 2023
Published print:	Jul 21, 2023

Web of science:	WOS:001035225500001
Scopus:	2-s2.0-85166261172
OpenAlex:	W4385224121

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