Carbon-Rich Plasma-Deposited Silicon Oxycarbonitride Films Derived from 4-(Trimethylsilyl)morpholine as a Novel Single-Source Precursor

Carbon-Rich Plasma-Deposited Silicon Oxycarbonitride Films Derived from 4-(Trimethylsilyl)morpholine as a Novel Single-Source Precursor Научная публикация

Журнал

ChemPlusChem
ISSN: 1212-6950 , E-ISSN: 0010-0765

Вых. Данные

Год: 2024, Том: 89, Номер статьи : e202400094, Страниц : 13 DOI: 10.1002/cplu.202400094

Ключевые слова

PECVD; morpholine; optical bandgap; optical emission spectroscopy; organosilicon precursor; refractive index; silicon oxycarbonitride (SiCNO) coatings; thin film

Авторы

Ermakova Evgeniya ¹ , Tsyrendorzhieva Irina ² , Mareev Alexander ² , Pavlov Dmitry ² , Maslova Olga ¹ , Shayapov Vladimir ¹ , Maksimovskiy Eugene ¹ , Yushina Irina ¹ , Kosinova Marina ¹

Организации

1	Nikolaev Institute of Inorganic Chemistry, SB RAS
2	Favorsky Irkutsk Institute of Chemistry SB RAS

4-(trimethylsilyl)morpholine O(CH2CH2)2NSi(CH3)3 (TMSM) was investigated as a single-source precursor for SiCNO films synthesis. Optical emission spectroscopy of plasma generated from TMSM/He, TMSM/H2, and TMSM/NH3 gas mixtures revealed the presence of N2, CH, H, CN, and CO species. The last two are suggested to be responsible for the lowering of carbon concentration in the films in comparison with the precursor. The refractive index ranged from 1.5 to 2.0, and bandgap varied from 2.0 to 4.6 eV, which pointed that some of the films can be used as antireflective coatings in silicon photovoltaic cell technologies and dielectric layers in electronic devices.

Ermakova E. , Tsyrendorzhieva I. , Mareev A. , Pavlov D. , Maslova O. , Shayapov V. , Maksimovskiy E. , Yushina I. , Kosinova M.
Carbon-Rich Plasma-Deposited Silicon Oxycarbonitride Films Derived from 4-(Trimethylsilyl)morpholine as a Novel Single-Source Precursor
ChemPlusChem. 2024. V.89. e202400094 :1-13. DOI: 10.1002/cplu.202400094 WOS Scopus РИНЦ OpenAlex

Поступила в редакцию:	2 февр. 2024 г.
Принята к публикации:	24 апр. 2024 г.
Опубликована в печати:	22 мая 2024 г.

Web of science:	WOS:001228585300001
Scopus:	2-s2.0-85193818670
РИНЦ:	67255149
OpenAlex:	W4395458375

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