Carbon-Rich Plasma-Deposited Silicon Oxycarbonitride Films Derived from 4-(Trimethylsilyl)morpholine as a Novel Single-Source Precursor

Carbon-Rich Plasma-Deposited Silicon Oxycarbonitride Films Derived from 4-(Trimethylsilyl)morpholine as a Novel Single-Source Precursor Full article

Journal

ChemPlusChem
ISSN: 1212-6950 , E-ISSN: 0010-0765

Output data

Year: 2024, Volume: 89, Article number : e202400094, Pages count : 13 DOI: 10.1002/cplu.202400094

Tags

PECVD; morpholine; optical bandgap; optical emission spectroscopy; organosilicon precursor; refractive index; silicon oxycarbonitride (SiCNO) coatings; thin film

Authors

Ermakova Evgeniya ¹ , Tsyrendorzhieva Irina ² , Mareev Alexander ² , Pavlov Dmitry ² , Maslova Olga ¹ , Shayapov Vladimir ¹ , Maksimovskiy Eugene ¹ , Yushina Irina ¹ , Kosinova Marina ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, SB RAS
2	Favorsky Irkutsk Institute of Chemistry SB RAS

4-(trimethylsilyl)morpholine O(CH2CH2)2NSi(CH3)3 (TMSM) was investigated as a single-source precursor for SiCNO films synthesis. Optical emission spectroscopy of plasma generated from TMSM/He, TMSM/H2, and TMSM/NH3 gas mixtures revealed the presence of N2, CH, H, CN, and CO species. The last two are suggested to be responsible for the lowering of carbon concentration in the films in comparison with the precursor. The refractive index ranged from 1.5 to 2.0, and bandgap varied from 2.0 to 4.6 eV, which pointed that some of the films can be used as antireflective coatings in silicon photovoltaic cell technologies and dielectric layers in electronic devices.

Ermakova E. , Tsyrendorzhieva I. , Mareev A. , Pavlov D. , Maslova O. , Shayapov V. , Maksimovskiy E. , Yushina I. , Kosinova M.
Carbon-Rich Plasma-Deposited Silicon Oxycarbonitride Films Derived from 4-(Trimethylsilyl)morpholine as a Novel Single-Source Precursor
ChemPlusChem. 2024. V.89. e202400094 :1-13. DOI: 10.1002/cplu.202400094 WOS Scopus РИНЦ OpenAlex

Submitted:	Feb 2, 2024
Accepted:	Apr 24, 2024
Published print:	May 22, 2024

Web of science:	WOS:001228585300001
Scopus:	2-s2.0-85193818670
Elibrary:	67255149
OpenAlex:	W4395458375

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