Phase formation in ALD Hf1–xTixO2 and Zr1–xTixO2 films from amorphous to crystalline solid solutions

Phase formation in ALD Hf1–xTixO2 and Zr1–xTixO2 films from amorphous to crystalline solid solutions Full article

Journal

Bulletin of Materials Science
ISSN: 0973-7669 , E-ISSN: 0250-4707

Output data

Year: 2026, Volume: 49, Article number : 173, Pages count : 14 DOI: 10.1007/s12034-026-03653-0

Tags

Atomic layer deposition; mixed oxides; phase formation; solid solution.

Authors

KHIZHNYAK EUGENE A ¹ , SHAYAPOV VLADIMIR R ¹ , FEDORENKO ANASTASIYA D ¹ , KOROLKOV ILYA V ¹ , GORYAINOV SERGEI V ² , MAXIMOVSKIY EUGENE A ¹ , LEBEDEV MIKHAIL S ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry SB RAS
2	Sobolev Institute of Geology and Mineralogy SB RAS

Funding (1)

KHIZHNYAK E.A. , SHAYAPOV V.R. , FEDORENKO A.D. , KOROLKOV I.V. , GORYAINOV S.V. , MAXIMOVSKIY E.A. , LEBEDEV M.S.
Phase formation in ALD Hf1–xTixO2 and Zr1–xTixO2 films from amorphous to crystalline solid solutions
Bulletin of Materials Science. 2026. V.49. 173 :1-14. DOI: 10.1007/s12034-026-03653-0 WOS Scopus

Submitted:	Nov 7, 2025
Accepted:	Feb 11, 2026
Published print:	Aug 17, 2026
Published online:	Aug 17, 2026

≡ Web of science:	WOS:001851245800001
≡ Scopus:	2-s2.0-105047544966