Chemical Structure and Stability of Amorphous SiCxNy:H Films Prepared by ICP CVD Using Disilazanes

Chemical Structure and Stability of Amorphous SiCxNy:H Films Prepared by ICP CVD Using Disilazanes Full article

Journal

Journal of Structural Chemistry
ISSN: 1573-8779 , E-ISSN: 0022-4766

Output data

Year: 2026, Volume: 67, Number: 2, Pages: 426-441 Pages count : 16 DOI: 10.1134/s0022476626020174

Authors

Chagin M.N. ¹ , Sulyaeva V.S. ¹ , Ermakova E.N. ¹ , Maksimovskiy E.A. ¹ , Asanov I.P. ¹ , Kolodin A.N. ¹ , Yushina I.V. ¹ , Tu R. ² , Kosinova M.L. ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
2	Wuhan University of Technology, Wuhan, People’s Republic of China

Funding (1)

Russian Science Foundation

Chagin M.N. , Sulyaeva V.S. , Ermakova E.N. , Maksimovskiy E.A. , Asanov I.P. , Kolodin A.N. , Yushina I.V. , Tu R. , Kosinova M.L.
Chemical Structure and Stability of Amorphous SiCxNy:H Films Prepared by ICP CVD Using Disilazanes
Journal of Structural Chemistry. 2026. V.67. N2. P.426-441. DOI: 10.1134/s0022476626020174 OpenAlex

Чагин М.Н. , Суляева В.С. , Ермакова Е.Н. , Максимовский Е.А. , Асанов И.П. , Колодин А.Н. , Юшина И.В. , Tu R. , Косинова М.Л.
Химическая структура и стабильность аморфных пленок SiCxNy:H, полученных методом ICP CVD с использованием дисилазанов
Журнал структурной химии. 2026. Т.67. №2. 161463 . DOI: 10.26902/JSC_id161463 OpenAlex

Submitted:	Nov 21, 2025
Published print:	Mar 13, 2026

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