Optical Properties of Hf-Ti-O Films Obtained by Atomic Layer Deposition ArticleGenre_short.OTHER
| Source | 2025 IEEE 26th International Con-ference of Young Professionals in Electron Devices and Materials (EDM) 27 июня - 1 июля 2025 Compilation, IEEE Xplore. 2025. |
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| Output data | Year: 2025, DOI: 10.1109/EDM65517.2025.11096808 | ||
| Tags | atomic layer deposition, titanium dioxide, hafnium doixide, refractive index, band gap, film | ||
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Cite:
Evgeny Khizhnyak
, Vladimir Shayapov
, Irina Yushina
, Mikhail Lebedev
Optical Properties of Hf-Ti-O Films Obtained by Atomic Layer Deposition
In compilation 2025 IEEE 26th International Con-ference of Young Professionals in Electron Devices and Materials (EDM) 27 июня - 1 июля 2025. – IEEE Xplore., 2025. DOI: 10.1109/EDM65517.2025.11096808
Optical Properties of Hf-Ti-O Films Obtained by Atomic Layer Deposition
In compilation 2025 IEEE 26th International Con-ference of Young Professionals in Electron Devices and Materials (EDM) 27 июня - 1 июля 2025. – IEEE Xplore., 2025. DOI: 10.1109/EDM65517.2025.11096808
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