Growth of TiSiN Films by Room-Temperature Reactive Magnetron Sputtering

Growth of TiSiN Films by Room-Temperature Reactive Magnetron Sputtering Full article

Journal

Inorganic Materials
ISSN: 0020-1685 , E-ISSN: 1608-3172

Output data

Year: 2024, Volume: 60, Number: 6, Pages: 723-730 Pages count : 8 DOI: 10.1134/S0020168524700948

Authors

Sulyaeva V.S. ¹ , Syrokvashin M.M. ¹ , Kozhevnikov A.K. ¹ , Ermakova E.N. ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry SB RAS

Sulyaeva V.S. , Syrokvashin M.M. , Kozhevnikov A.K. , Ermakova E.N.
Growth of TiSiN Films by Room-Temperature Reactive Magnetron Sputtering
Inorganic Materials. 2024. V.60. N6. P.723-730. DOI: 10.1134/S0020168524700948 WOS OpenAlex

Суляева В.С. , Сыроквашин М.М. , Кожевников А.К. , Ермакова Е.Н.
Синтез пленок TiSiN методом реактивного магнетронного распыления при комнатной температуре
Неорганические материалы. 2024. Т.60. №2. С.164-174. DOI: 10.31857/S0002337X24020044 РИНЦ

Published print:

Mar 10, 2025

Web of science:	WOS:001441493200003
OpenAlex:	W4408285565

Пока нет цитирований