Amorphous SiCx:H and SiCxNy:H Films Obtained from Hexamethyldisilane Vapor in Inductively Coupled RF Discharge Plasma

Amorphous SiCx:H and SiCxNy:H Films Obtained from Hexamethyldisilane Vapor in Inductively Coupled RF Discharge Plasma Full article

Journal

High Energy Chemistry
ISSN: 0018-1439 , E-ISSN: 1608-3148

Output data

Year: 2024, Volume: 58, Number: 6, Pages: 693-698 Pages count : 6 DOI: 10.1134/S0018143924700565

Tags

hexamethyldisilane, ICP CVD, hydrogenated silicon carbide and silicon carbonitride films, optical emission spectroscopy

Authors

Chagin M.N. ¹ , Ermakova E.N. ¹ , Shayapov V.R. ¹ , Sulyaeva V.S. ¹ , Maksimovskii E.A. ¹ , Yushina I.V. ¹ , Kosinova M.L. ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090 Russia

Amorphous films of hydrogenated silicon carbide SiCx:H and carbonitride SiCxNy:H have been synthesized in an RF inductively coupled plasma reactor using hexamethyldisilane vapor and additional argon and/or nitrogen gases. The deposition process was carried out at temperatures of 50–400°C and plasma powers of 100–400 W. The dependences of the growth rate, chemical composition and structure of films, light transmittance, refractive index, and optical band gap on synthesis conditions have been obtained. An in situ study of the gas phase composition was performed using optical emission spectroscopy.

Chagin M.N. , Ermakova E.N. , Shayapov V.R. , Sulyaeva V.S. , Maksimovskii E.A. , Yushina I.V. , Kosinova M.L.
Amorphous SiCx:H and SiCxNy:H Films Obtained from Hexamethyldisilane Vapor in Inductively Coupled RF Discharge Plasma
High Energy Chemistry. 2024. V.58. N6. P.693-698. DOI: 10.1134/S0018143924700565 Scopus РИНЦ OpenAlex

Чагин М.Н. , Ермакова Е.Н. , Шаяпов В.Р. , Суляева В.С. , Максимовский Е.А. , Юшина И.В. , Косинова М.Л.
Аморфные пленки SiCx:H и SiCxNy:H, полученные из паров гексаметилдисилана в индуктивно-связанной плазме ВЧ разряда
Химия высоких энергий. 2024.

Published print:

Dec 2, 2024

Scopus:	2-s2.0-85208485468
Elibrary:	74496527
OpenAlex:	W4403974054

Пока нет цитирований