Modeling of the Optical Properties of Black Silicon Passivated by Thin Films of Metal Oxides Full article
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Journal of contemporary physics /
ISSN: 1934-9378 , E-ISSN: 1068-3372 |
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| Output data | Year: 2020, Volume: 55, Number: 1, Pages: 16-22 Pages count : 7 DOI: 10.3103/s106833722001003x | ||||||
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Abstract:
Using the finite difference time domain (FDTD) method, we studied the optical properties of black silicon (BSi) layers passivated with the various metal oxides (Al2O3, TiO2, HfO2, and Sc2O3) films, obtained by atomic layer deposition (ALD) method. The results of FDTD modeling indicate an improvement in the antireflection properties of BSi/ALD film structures in the wide spectral range. The necessity to choose the optimal film thickness is shown.
Cite:
Katkov M.V.
, Ayvazyan G.Y.
, Shayapov V.R.
, Lebedev M.S.
Modeling of the Optical Properties of Black Silicon Passivated by Thin Films of Metal Oxides
Journal of contemporary physics /. 2020. V.55. N1. P.16-22. DOI: 10.3103/s106833722001003x Scopus OpenAlex
Modeling of the Optical Properties of Black Silicon Passivated by Thin Films of Metal Oxides
Journal of contemporary physics /. 2020. V.55. N1. P.16-22. DOI: 10.3103/s106833722001003x Scopus OpenAlex
Original:
Катков М.В.
, Айвазян Г.Е.
, Шаяпов В.Р.
, Лебедев М.С.
МОДЕЛИРОВАНИЕ ОПТИЧЕСКИХ СВОЙСТВ ЧЁРНОГО КРЕМНИЯ, ПАССИВИРОВАННОГО ТОНКИМИ ПЛЁНКАМИ ОКСИДОВ МЕТАЛЛОВ
Известия НАН РА. Физика. 2020. Т.55. №1. С.24-32.
МОДЕЛИРОВАНИЕ ОПТИЧЕСКИХ СВОЙСТВ ЧЁРНОГО КРЕМНИЯ, ПАССИВИРОВАННОГО ТОНКИМИ ПЛЁНКАМИ ОКСИДОВ МЕТАЛЛОВ
Известия НАН РА. Физика. 2020. Т.55. №1. С.24-32.
Dates:
| Submitted: | Sep 6, 2019 |
| Accepted: | Dec 6, 2019 |
| Published print: | Mar 23, 2020 |
| Published online: | Mar 23, 2020 |
Identifiers:
| Scopus: | 2-s2.0-85082529930 |
| OpenAlex: | W3014055291 |