Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma

Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma Научная публикация

Журнал

Glass Physics and Chemistry
ISSN: 1608-313X , E-ISSN: 1087-6596

Вых. Данные

Год: 2019, Том: 45, Номер: 6, Страницы: 525-531 Страниц : 7 DOI: 10.1134/S108765961906018X

Ключевые слова

PECVD, silicon carbonitride, hexamethylcyclotrisilazane, emission spectroscopy

Авторы

Shayapov V.R. ¹ , Chagin M.N. ¹ , Kolodin A.N. ¹ , Kosinova M.L. ¹

Организации

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences,

In an inductively coupled high-frequency discharge plasma, SiCxNy:H films are obtained from a mixture of hexamethylcyclotrisilazane vapor and argon at substrate temperatures of 100 to 400°C and a discharge power of 200 W. The simplest plasma components (nitrogen, cyan, silicon atoms, CH free radicals, and C2 dimers) are determined. Some physicochemical properties of the films, including the growth rate, types of chemical bonds, refractive index, transparency interval, and contact angle, are studied. The synthesized films have a polymer-like structure.

Shayapov V.R. , Chagin M.N. , Kolodin A.N. , Kosinova M.L.
Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma
Glass Physics and Chemistry. 2019. V.45. N6. P.525-531. DOI: 10.1134/S108765961906018X WOS Scopus OpenAlex

Шаяпов В.Р. , Чагин М.Н. , Колодин А.Н. , Косинова М.Л.
ОСАЖДЕНИЕ ПЛЕНОК ИЗ СМЕСИ ПАРОВ ГЕКСАМЕТИЛЦИКЛОТРИСИЛАЗАНА И АРГОНА В ИНДУКТИВНО-СВЯЗАННОЙ ПЛАЗМЕ
Физика и химия стекла. 2019. Т.45. №6. С.519-527. DOI: 10.1134/S0132665119060180 РИНЦ OpenAlex

Поступила в редакцию:	23 мая 2019 г.
Принята к публикации:	7 авг. 2019 г.

Web of science:	WOS:000512779100017
Scopus:	2-s2.0-85079355879
OpenAlex:	W3005621324

БД	Цитирований
Scopus	2
OpenAlex	2
Web of science	2