Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma

Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma Full article

Journal

Glass Physics and Chemistry
ISSN: 1608-313X , E-ISSN: 1087-6596

Output data

Year: 2019, Volume: 45, Number: 6, Pages: 525-531 Pages count : 7 DOI: 10.1134/S108765961906018X

Tags

PECVD, silicon carbonitride, hexamethylcyclotrisilazane, emission spectroscopy

Authors

Shayapov V.R. ¹ , Chagin M.N. ¹ , Kolodin A.N. ¹ , Kosinova M.L. ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences,

In an inductively coupled high-frequency discharge plasma, SiCxNy:H films are obtained from a mixture of hexamethylcyclotrisilazane vapor and argon at substrate temperatures of 100 to 400°C and a discharge power of 200 W. The simplest plasma components (nitrogen, cyan, silicon atoms, CH free radicals, and C2 dimers) are determined. Some physicochemical properties of the films, including the growth rate, types of chemical bonds, refractive index, transparency interval, and contact angle, are studied. The synthesized films have a polymer-like structure.

Shayapov V.R. , Chagin M.N. , Kolodin A.N. , Kosinova M.L.
Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma
Glass Physics and Chemistry. 2019. V.45. N6. P.525-531. DOI: 10.1134/S108765961906018X Scopus OpenAlex

Шаяпов В.Р. , Чагин М.Н. , Колодин А.Н. , Косинова М.Л.
ОСАЖДЕНИЕ ПЛЕНОК ИЗ СМЕСИ ПАРОВ ГЕКСАМЕТИЛЦИКЛОТРИСИЛАЗАНА И АРГОНА В ИНДУКТИВНО-СВЯЗАННОЙ ПЛАЗМЕ
Физика и химия стекла. 2019. Т.45. №6. С.519-527. DOI: 10.1134/S0132665119060180 РИНЦ OpenAlex

Submitted:	May 23, 2019
Accepted:	Aug 7, 2019

Scopus:	2-s2.0-85079355879
OpenAlex:	W3005621324

DB	Citing
Scopus	2
OpenAlex	2