Chemical Composition and Properties of Films Produced from Hexamethyldisilazane by PlasmaEnhanced Chemical Vapor Deposition Научная публикация
| Журнал |
High Energy Chemistry
ISSN: 0018-1439 , E-ISSN: 1608-3148 |
||
|---|---|---|---|
| Вых. Данные | Год: 2016, Том: 50, Номер: 3, Страницы: 213-218 Страниц : 6 DOI: 10.1134/S0018143916030127 | ||
| Ключевые слова | plasma-enhanced chemical vapor deposition, plasma polymerization, hexamethyldisilazane | ||
| Авторы |
|
||
| Организации |
|
Реферат:
Relationships between the chemical composition of the gas phase and the properties of SiCxNyHz films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition have been studied. The plasma composition has been examined by optical emission spectroscopy. Thermal analysis of the films with simultaneous mass spectrometric detection of released gases has been performed. On the basis of the results and published data, mechanisms for the formation of films by plasma polymerization have been proposed and the film growth at a low plasma power and high reactor temperatures has been found to follow the heterogeneous mechanism.
Библиографическая ссылка:
Shayapov V.R.
, Rumyantsev Y.M.
, Plyusnin P.E.
Chemical Composition and Properties of Films Produced from Hexamethyldisilazane by PlasmaEnhanced Chemical Vapor Deposition
High Energy Chemistry. 2016. V.50. N3. P.213-218. DOI: 10.1134/S0018143916030127 WOS Scopus РИНЦ OpenAlex
Chemical Composition and Properties of Films Produced from Hexamethyldisilazane by PlasmaEnhanced Chemical Vapor Deposition
High Energy Chemistry. 2016. V.50. N3. P.213-218. DOI: 10.1134/S0018143916030127 WOS Scopus РИНЦ OpenAlex
Оригинальная:
Шаяпов В.Р.
, Румянцев Ю.М.
, Плюснин П.Е.
Химический состав плазмы и свойства пленок, полученных плазмохимическим осаждением из паров гексаметилдисилазана
Химия высоких энергий. 2016. Т.50. №3. С.221-226. DOI: 10.7868/S002311931603013X РИНЦ OpenAlex
Химический состав плазмы и свойства пленок, полученных плазмохимическим осаждением из паров гексаметилдисилазана
Химия высоких энергий. 2016. Т.50. №3. С.221-226. DOI: 10.7868/S002311931603013X РИНЦ OpenAlex
Даты:
| Поступила в редакцию: | 10 июн. 2015 г. |
Идентификаторы БД:
| Web of science: | WOS:000376426800010 |
| Scopus: | 2-s2.0-84969849007 |
| РИНЦ: | 27154618 |
| OpenAlex: | W2400954287 |