Abstract: Relationships between the chemical composition of the gas phase and the properties of SiCxNyHz films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition have been studied. The plasma composition has been examined by optical emission spectroscopy. Thermal analysis of the films with simultaneous mass spectrometric detection of released gases has been performed. On the basis of the results and published data, mechanisms for the formation of films by plasma polymerization have been proposed and the film growth at a low plasma power and high reactor temperatures has been found to follow the heterogeneous mechanism.

Cite: Shayapov V.R. , Rumyantsev Y.M. , Plyusnin P.E.
Chemical Composition and Properties of Films Produced from Hexamethyldisilazane by PlasmaEnhanced Chemical Vapor Deposition
High Energy Chemistry. 2016. V.50. N3. P.213-218. DOI: 10.1134/S0018143916030127 WOS Scopus РИНЦ OpenAlex

Original: Шаяпов В.Р. , Румянцев Ю.М. , Плюснин П.Е.
Химический состав плазмы и свойства пленок, полученных плазмохимическим осаждением из паров гексаметилдисилазана
Химия высоких энергий. 2016. Т.50. №3. С.221-226. DOI: 10.7868/S002311931603013X РИНЦ OpenAlex

Dates:

Submitted:

Jun 10, 2015

Identifiers:

Web of science:	WOS:000376426800010
Scopus:	2-s2.0-84969849007
Elibrary:	27154618
OpenAlex:	W2400954287

Citing:

DB	Citing
OpenAlex	2
Scopus	2
Web of science	2
Elibrary	1

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