Anti-Reflection Properties of Black Silicon Coated with Thin Films of Metal Oxides by Atomic Layer Deposition

Anti-Reflection Properties of Black Silicon Coated with Thin Films of Metal Oxides by Atomic Layer Deposition Full article

Journal

Journal of contemporary physics /
ISSN: 1934-9378 , E-ISSN: 1068-3372

Output data

Year: 2021, Volume: 56, Number: 3, Pages: 240-246 Pages count : 7 DOI: 10.3103/s1068337221030075

Authors

Ayvazyan G.Y. ¹ , Katkov M.V. ^2,3 , Lebedev M.S. ² , Shayapov V.R. ² , Afonin M.Yu. ² , Petukhova D.E. ² , Yushina I.V. ² , Maksimovskii E.A. ² , Aghabekyan A.V. ¹

Affiliations

1	National Polytechnic University of Armenia
2	Institute of Inorganic Chemistry, A.V. Nikolaev SB RAS
3	Durban University of Technology

The results of experimental studies of the anti-reflection properties of black silicon (b-Si) layers coated with thin films of TiO2, HfO2, and Sc2O3 metal oxides by atomic layer deposition (ALD) are presented. An improvement in the antireflection properties of b-Si in a wide spectral range is shown. It is expedient to use the investigated ALD films in solar cells as an effective passivating coating of the b-Si surface.

Ayvazyan G.Y. , Katkov M.V. , Lebedev M.S. , Shayapov V.R. , Afonin M.Y. , Petukhova D.E. , Yushina I.V. , Maksimovskii E.A. , Aghabekyan A.V.
Anti-Reflection Properties of Black Silicon Coated with Thin Films of Metal Oxides by Atomic Layer Deposition
Journal of contemporary physics /. 2021. V.56. N3. P.240-246. DOI: 10.3103/s1068337221030075 WOS Scopus OpenAlex

Submitted:	May 2, 2021
Accepted:	Jun 10, 2021

Web of science:	WOS:000696535500013
Scopus:	2-s2.0-85115140042
OpenAlex:	W3201137252

DB	Citing
OpenAlex	19
Scopus	11
Web of science	12