Impact of Growth Temperature During Pulsed Magnetron Sputtering on the Structure and Defects of Aluminum Nitride Films

Impact of Growth Temperature During Pulsed Magnetron Sputtering on the Structure and Defects of Aluminum Nitride Films Full article

Journal

Journal of Structural Chemistry
ISSN: 1573-8779 , E-ISSN: 0022-4766

Output data

Year: 2026, Volume: 67, Number: 8, Pages: 1704-1714 Pages count : 11 DOI: 10.1134/s0022476626080056

Authors

Bogoslovtseva A.L. ¹ , Shayapov V.R. ^1,2 , Chepkasov S.Y. ¹ , Mironova M.I. ¹ , Kapishnikov A.V. ¹ , Marin D.V. ¹ , Geidt P.V. ¹

Affiliations

1	Novosibirsk State University, Novosibirsk, Russia
2	Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia

Funding (1)

Bogoslovtseva A.L. , Shayapov V.R. , Chepkasov S.Y. , Mironova M.I. , Kapishnikov A.V. , Marin D.V. , Geidt P.V.
Impact of Growth Temperature During Pulsed Magnetron Sputtering on the Structure and Defects of Aluminum Nitride Films
Journal of Structural Chemistry. 2026. V.67. N8. P.1704-1714. DOI: 10.1134/s0022476626080056 WOS Scopus OpenAlex

Богословцева А.Л. , Шаяпов В.Р. , Чепкасов С.Ю. , Миронова М.И. , Капишников А.В. , Марин Д.В. , Гейдт П.В.
ВЛИЯНИЕ ТЕМПЕРАТУРЫ РОСТА ПРИ ИМПУЛЬСНОМ МАГНЕТРОННОМ РАСПЫЛЕНИИ НА СТРУКТУРУ И ДЕФЕКТЫ ПЛЕНОК НИТРИДА АЛЮМИНИЯ
Журнал структурной химии. 2026. Т.67. №8. 169916 . DOI: 10.26902/jsc_id169916

Submitted:	Apr 3, 2026
Published print:	Sep 4, 2026

≡ Web of science:	WOS:001868313500003
≡ Scopus:	2-s2.0-105049330679
≡ OpenAlex:	W7208737444