Processes of Coating Formation by Pulsed MOCVD in the ZrO2–HfO2 System.

Processes of Coating Formation by Pulsed MOCVD in the ZrO2–HfO2 System. Full article

Journal

Journal of Structural Chemistry
ISSN: 1573-8779 , E-ISSN: 0022-4766

Output data

Year: 2024, Volume: 65, Number: 11, Pages: 2135–2142 Pages count : DOI: 10.1134/S0022476624110027

Authors

Shutilov Roman Aleksandrovich ¹ , Maksimovskii Evgenii Anatolʹevich ¹ , Popovetskiy Pavel Sergeevich ¹ , Korolʹkov Ilʹya Viktorovich ¹ , Гисматулин А.А. ² , Igumenov Igorʹ Konstantinovich ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch of Russian Academy of Sciences
2	Institute of Semiconductor Physics SB RAS

Shutilov R.A. , Maksimovskii E.A. , Popovetskiy P.S. , Korolʹkov I.V. , Гисматулин А.А. , Igumenov I.K.
Processes of Coating Formation by Pulsed MOCVD in the ZrO2–HfO2 System.
Journal of Structural Chemistry. 2024. V.65. N11. P.2135–2142. DOI: 10.1134/S0022476624110027 WOS Scopus РИНЦ OpenAlex

Шутилов Р.А. , Максимовский Е.А. , Поповецкий П.С. , Корольков И.В. , Гисматулин А.А. , Игуменов И.К.
Процессы формирования покрытий методом импульсного MOCVD в системе ZrO2-HfO2
Журнал структурной химии. 2024. Т.65. №11. 134521 . DOI: 10.26902/JSC_id134521 РИНЦ OpenAlex

Submitted:	Apr 15, 2024
Accepted:	Jun 25, 2024
Published print:	Dec 2, 2024
Published online:	Dec 2, 2024

Web of science:	WOS:001376818100007
Scopus:	2-s2.0-85211148031
Elibrary:	75143222
OpenAlex:	W4404905147

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