Abstract: Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3- tetramethyldisilazane (HSi(CH3)2)2NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O2+xN2), a method is developed to obtain SiCxNyOz:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The in situ composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.

Cite: Fainer N.I. , Plekhanov A.G. , Golubenko A.N. , Rumyantsev Y.M. , Maksimovskii E.A. , Shayapov V.R.
STRUCTURE AND ELEMENTAL COMPOSITION OF TRANSPARENT NANOCOMPOSITE SILICON OXYCARBONITRIDE FILMS
Journal of Structural Chemistry. 2017. V.58. N1. P.119-125. DOI: 10.1134/S0022476617010188 WOS Scopus OpenAlex

Original: Файнер Н.И. , Плеханов А.Г. , Голубенко А.Н. , Румянцев Ю.М. , Максимовский Е.А. , Шаяпов В.Р.
Структура и элементный состав прозрачных нанокомпозитных пленок оксикарбонитрида кремния
Журнал структурной химии. 2017. Т.58. №1. С.125-132. DOI: 10.15372/JSC20170118 OpenAlex

Identifiers:

Web of science:	WOS:000397030000018
Scopus:	2-s2.0-85016007349
OpenAlex:	W2597877185

Citing:

DB	Citing
Scopus	8
OpenAlex	8
Web of science	8

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