Composition-sensitive growth kinetics and dispersive optical properties of thin HfxTi1−xO2 (0 ≤ x ≤ 1) films prepared by the ALD method

Composition-sensitive growth kinetics and dispersive optical properties of thin HfxTi1−xO2 (0 ≤ x ≤ 1) films prepared by the ALD method Full article

Journal

Journal of Materials Science: Materials in Electronics
ISSN: 1573-482X , E-ISSN: 0957-4522

Output data

Year: 2019, Volume: 30, Number: 1, Pages: 812-823 Pages count : 12 DOI: 10.1007/s10854-018-0351-z

Authors

Atuchin V.V. ^1,2 , Lebedev M.S. ³ , Korolkov I.V. ^4,5 , Kruchinin V.N. ⁶ , Maksimovskii E.A. ^3,5 , Trubin S.V. ⁷

Affiliations

1	Laboratory of Optical Materials and Structures, Institute of Semiconductor Physics, SB RAS, Novosibirsk, Russia, 630090
2	Laboratory of Semiconductor and Dielectric Materials, Novosibirsk State University, Novosibirsk, Russia 630090
3	Laboratory of Functional Films and Coatings, Nikolaev Institute of Inorganic Chemistry, SB RAS, Novosibirsk, Russia, 630090
4	Laboratory of Crystal Chemistry, Nikolaev Institute of Inorganic Chemistry, SB RAS, Novosibirsk, Russia, 630090
5	Laboratory of Research Methods of Composition and Structure of Functional Materials, Novosibirsk State University, Novosibirsk, Russia 630090
6	Laboratory for Ellipsometry of Semiconductor Materials and Structures, Institute of Semiconductor Physics, SB RAS, Novosibirsk, Russia, 630090
7	Laboratory for Chemistry of Volatile Coordination and Metallorganic Compounds, Nikolaev Institute of Inorganic Chemistry, SB RAS, Novosibirsk, Russia, 630090

Atuchin V.V. , Lebedev M.S. , Korolkov I.V. , Kruchinin V.N. , Maksimovskii E.A. , Trubin S.V.
Composition-sensitive growth kinetics and dispersive optical properties of thin HfxTi1−xO2 (0 ≤ x ≤ 1) films prepared by the ALD method
Journal of Materials Science: Materials in Electronics. 2019. V.30. N1. P.812-823. DOI: 10.1007/s10854-018-0351-z WOS Scopus OpenAlex

Submitted:	Oct 8, 2018
Accepted:	Nov 8, 2018
Published online:	Nov 13, 2018

Web of science:	WOS:000456048800087
Scopus:	2-s2.0-85056460912
OpenAlex:	W2901255812

DB	Citing
OpenAlex	31
Scopus	30
Web of science	31