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PECVD synthesis, optical and mechanical properties of silicon carbon nitride films Full article

Journal Applied Surface Science
ISSN: 1873-5584 , E-ISSN: 0169-4332
Output data Year: 2015, Volume: 339, Pages: 102-108 Pages count : 7 DOI: 10.1016/j.apsusc.2015.02.155
Tags SiCN films, PECVD, Optical band gap, Hardness, Young's modulus
Authors Ermakova Evgeniya 1 , Rumyantsev Yurii 1 , Shugarov Artur 2 , Panin Alexey 2,3 , Kosinova Marina 1
Affiliations
1 Nikolaev Institute of Inorganic Chemistry SB RAS
2 Institute of Strength Physics and Materials Science SB RAS
3 National Research Tomsk Polytechnic University

Abstract: SiCxNy thin films were synthesized at a temperature of 700 °C by the PECVD process, using trimethylphenylsilane C6H5Si(CH3)3 (TMPhS) and ammonia as a reactive mixture. The effect of NH3 dilution on the structure and chemical bonding of SiCxNy films was investigated by Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, high-resolution transmission electron microscopy and energy-dispersive X-ray analysis. The influence of deposition conditions on the transmittance, the optical band gap, the hardness and the Young's modulus of SiCxNy films was studied. It was shown that the chemical composition and the functional properties of the films are governed by the initial pressure ratio of NH3 to TMPhS. The variation of the ratio enables the film of different composition to be deposited, e.g. SiCx, SiCxNy and SiNy. It was shown that the films deposited from a reactive mixture with the highest ammonia dilution had a transmittance comparable to that of SiO2 and hardness of 23 GPa.
Cite: Ermakova E. , Rumyantsev Y. , Shugarov A. , Panin A. , Kosinova M.
PECVD synthesis, optical and mechanical properties of silicon carbon nitride films
Applied Surface Science. 2015. V.339. P.102-108. DOI: 10.1016/j.apsusc.2015.02.155 WOS Scopus РИНЦ OpenAlex
Dates:
Submitted: Nov 13, 2014
Accepted: Feb 24, 2015
Published online: Mar 1, 2015
Published print: Jun 1, 2015
Identifiers:
Web of science: WOS:000351632600014
Scopus: 2-s2.0-84933036833
Elibrary: 24052103
OpenAlex: W1975087148
Citing:
DB Citing
Scopus 37
Web of science 35
OpenAlex 40
Elibrary 37
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