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Chemical Composition of an Inductively Coupled Hexamethyldisilazane–Argon Plasma and Properties of Films Grown in this Plasma Full article

Journal Inorganic Materials
ISSN: 0020-1685 , E-ISSN: 1608-3172
Output data Year: 2016, Volume: 52, Number: 6, Pages: 630-636 Pages count : 7 DOI: 10.1134/S0020168516050150
Tags plasma-enhanced chemical vapor deposition, thin films, optical emission spectroscopy
Authors Shayapov V.R. 1 , Chagin M.N. 1 , Rumyantsev Yu.M. 1
Affiliations
1 Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Abstract: The simplest components (atoms, diatomic molecules, and simple free radicals) of an inductively coupled rf plasma in a hexamethyldisilazane–argon mixture have been identified by optical emission spectroscopy. We have studied the influence of process conditions (plasma power and hexamethyldisilazane concentration in the mixture) on the intensity of lines and bands corresponding to these components and the corresponding changes in the composition and physicochemical properties of SiCxNyHz films grown in this plasma.
Cite: Shayapov V.R. , Chagin M.N. , Rumyantsev Y.M.
Chemical Composition of an Inductively Coupled Hexamethyldisilazane–Argon Plasma and Properties of Films Grown in this Plasma
Inorganic Materials. 2016. V.52. N6. P.630-636. DOI: 10.1134/S0020168516050150 WOS Scopus РИНЦ OpenAlex
Original: Шаяпов В.Р. , Чагин М.Н. , Румянцев Ю.М.
Химический состав индуктивно-связанной плазмы смеси гексаметилдисилазана с аргоном и свойства пленок, образующихся в такой плазме
Неорганические материалы. 2016. Т.52. №6. С.684-690. DOI: 10.7868/S0002337X16050158 РИНЦ OpenAlex
Dates:
Submitted: Sep 14, 2015
Identifiers:
Web of science: WOS:000376596500018
Scopus: 2-s2.0-84979586904
Elibrary: 27096090
OpenAlex: W2406003768
Citing:
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OpenAlex 3
Scopus 3
Web of science 3
Elibrary 3
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