Structural defects in SiCxNyHz films obtained by plasma-enhanced chemical deposition from hexamethyldisilazane vapor Full article

Journal	Journal of Structural Chemistry ISSN: 1573-8779 , E-ISSN: 0022-4766
Output data	Year: 2015, Volume: 56, Number: 6, Pages: 1070-1075 Pages count : 6 DOI: 10.1134/S0022476615060074
Authors	Shayapov V.R. 1 , Nadolinnyi V.A. 1 , Kozhemyachenko S.I. 1 , Rumyantsev Yu.M.Rumyantsev 1 , Fainer N.I. 1
Affiliations	1 Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences