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α-FeSi2 as a Buffer Layer for β-FeSi2 Growth: Analysis of Orientation Relationships in Silicide/Silicon, Silicide/Silicide Heterointerfaces Full article

Journal Surface investigation: x-ray, synchrotron and neutron techniques
ISSN: 1027-4510 , E-ISSN: 1819-7094
Output data Year: 2020, Volume: 14, Number: 4, Pages: 851-861 Pages count : 11 DOI: 10.1134/s1027451020040357
Authors Tarasov I.A. 1 , Bondarev I.A. 1 , Romanenko A.I. 2
Affiliations
1 Kirensky Institute of Physics, Federal Research Center KSC SB RAS, Krasnoyarsk, 660036 Russia
2 Nikolaev Institute of Inorganic Chemistry, Siberian Branch of Russian Academy of Sciences
Cite: Tarasov I.A. , Bondarev I.A. , Romanenko A.I.
α-FeSi2 as a Buffer Layer for β-FeSi2 Growth: Analysis of Orientation Relationships in Silicide/Silicon, Silicide/Silicide Heterointerfaces
Surface investigation: x-ray, synchrotron and neutron techniques. 2020. V.14. N4. P.851-861. DOI: 10.1134/s1027451020040357 WOS Scopus РИНЦ OpenAlex
Identifiers:
Web of science: WOS:000568081700034
Scopus: 2-s2.0-85089800135
Elibrary: 45345715
OpenAlex: W3080427968
Citing:
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Web of science 1
Scopus 1
Elibrary 1
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