α-FeSi2 as a Buffer Layer for β-FeSi2 Growth: Analysis of Orientation Relationships in Silicide/Silicon, Silicide/Silicide Heterointerfaces

α-FeSi2 as a Buffer Layer for β-FeSi2 Growth: Analysis of Orientation Relationships in Silicide/Silicon, Silicide/Silicide Heterointerfaces Научная публикация

Журнал

Surface investigation: x-ray, synchrotron and neutron techniques
ISSN: 1027-4510 , E-ISSN: 1819-7094

Вых. Данные

Год: 2020, Том: 14, Номер: 4, Страницы: 851-861 Страниц : 11 DOI: 10.1134/s1027451020040357

Авторы

Tarasov I.A. ¹ , Bondarev I.A. ¹ , Romanenko A.I. ²

Организации

1	Kirensky Institute of Physics, Federal Research Center KSC SB RAS, Krasnoyarsk, 660036 Russia
2	Nikolaev Institute of Inorganic Chemistry, Siberian Branch of Russian Academy of Sciences

Tarasov I.A. , Bondarev I.A. , Romanenko A.I.
α-FeSi2 as a Buffer Layer for β-FeSi2 Growth: Analysis of Orientation Relationships in Silicide/Silicon, Silicide/Silicide Heterointerfaces
Surface investigation: x-ray, synchrotron and neutron techniques. 2020. V.14. N4. P.851-861. DOI: 10.1134/s1027451020040357 WOS Scopus РИНЦ OpenAlex

Web of science:	WOS:000568081700034
Scopus:	2-s2.0-85089800135
РИНЦ:	45345715
OpenAlex:	W3080427968

БД	Цитирований
OpenAlex	1
Web of science	1
Scopus	1
РИНЦ	1