Role of melting, evaporation, and plasma shielding in surface morphology formation during nanosecond laser texturing of silicon

Role of melting, evaporation, and plasma shielding in surface morphology formation during nanosecond laser texturing of silicon Full article

Journal

Surfaces and Interfaces
ISSN: 2468-0230

Output data

Year: 2026, Volume: 97, Article number : 110008, Pages count : 8 DOI: 10.1016/j.surfin.2026.110008

Authors

Vasilev M.M. ¹ , Rodionov A.A. ¹ , Shukhov Yu.G. ¹ , Smirnov N.I. ^1,4 , Samokhvalov F.A. ¹ , Giannakis T. ² , Kandyla M. ² , Sulyaeva V.S. ³ , Starinskiy S.V. ¹

Affiliations

1	Kutateladze Institute of Thermophysics, Acad. Lavrentiev ave., 1, Novosibirsk, Russia
2	Theoretical and Physical Chemistry Institute, National Hellenic Research Foundation, 48 Vasileos Constantinou Avenue, 11635 Athens, Greece
3	Nikolaev Institute of Inorganic Chemistry, Acad. Lavrentiev ave., 3, Novosibirsk, Russia
4	Novosibirsk State University, Novosibirsk, Russia

Funding (1)

Vasilev M.M. , Rodionov A.A. , Shukhov Y.G. , Smirnov N.I. , Samokhvalov F.A. , Giannakis T. , Kandyla M. , Sulyaeva V.S. , Starinskiy S.V.
Role of melting, evaporation, and plasma shielding in surface morphology formation during nanosecond laser texturing of silicon
Surfaces and Interfaces. 2026. V.97. 110008 :1-8. DOI: 10.1016/j.surfin.2026.110008 Scopus

Submitted:	Apr 10, 2026
Accepted:	Jun 30, 2026
Published online:	Jul 2, 2026
Published print:	Sep 15, 2026

≡ Scopus:

2-s2.0-105044015539