Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization

Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization Full article

Journal

Surface & Coatings Technology
ISSN: 1879-3347 , E-ISSN: 0257-8972

Output data

Year: 2007, Volume: 201, Number: 22-23, Pages: 9009-9014 Pages count : 6 DOI: 10.1016/j.surfcoat.2007.04.016

Authors

Sulyaeva V.S. ¹ , Rumyantsev Yu.M. ¹ , Kosinova M.L. ¹ , Golubenko A.N. ¹ , Fainer N.I. ¹ , Kuznetsov F.A. ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry SB RAS, 3, Acad. Lavrentjev Pr., 630090, Novosibirsk, Russia

Sulyaeva V.S. , Rumyantsev Y.M. , Kosinova M.L. , Golubenko A.N. , Fainer N.I. , Kuznetsov F.A.
Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization
Surface & Coatings Technology. 2007. V.201. N22-23. P.9009-9014. DOI: 10.1016/j.surfcoat.2007.04.016 WOS Scopus РИНЦ OpenAlex

Published online:

Apr 13, 2007

Web of science:	WOS:000249340400040
Scopus:	2-s2.0-34547735965
Elibrary:	13545545
OpenAlex:	W1977065251

DB	Citing
OpenAlex	17
Web of science	17
Scopus	17
Elibrary	17