Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization Научная публикация
| Журнал |
Surface & Coatings Technology
ISSN: 1879-3347 , E-ISSN: 0257-8972 |
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| Вых. Данные | Год: 2007, Том: 201, Номер: 22-23, Страницы: 9009-9014 Страниц : 6 DOI: 10.1016/j.surfcoat.2007.04.016 | ||
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| Организации |
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Библиографическая ссылка:
Sulyaeva V.S.
, Rumyantsev Y.M.
, Kosinova M.L.
, Golubenko A.N.
, Fainer N.I.
, Kuznetsov F.A.
Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization
Surface & Coatings Technology. 2007. V.201. N22-23. P.9009-9014. DOI: 10.1016/j.surfcoat.2007.04.016 WOS Scopus РИНЦ OpenAlex
Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization
Surface & Coatings Technology. 2007. V.201. N22-23. P.9009-9014. DOI: 10.1016/j.surfcoat.2007.04.016 WOS Scopus РИНЦ OpenAlex
Даты:
| Опубликована online: | 13 апр. 2007 г. |
Идентификаторы БД:
| Web of science: | WOS:000249340400040 |
| Scopus: | 2-s2.0-34547735965 |
| РИНЦ: | 13545545 |
| OpenAlex: | W1977065251 |