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Computational fluid dynamics simulation of dual-showerhead configuration: Key to uniform large-scale chemical vapor deposition SiC coatings Full article

Journal Journal of Vacuum Science & Technology A
ISSN: 0734-2101 , E-ISSN: 1520-8559
Output data Year: 2025, Volume: 43, Number: 6, Article number : 063410, Pages count : DOI: 10.1116/6.0004837
Authors Tu Rong 1,2,3 , Liang Xin 1 , Xu Qingfang 1 , Ji Baifeng 4 , Li Qizhong 1 , Zhang Chitengfei 3 , Kosinova Marina L. 5 , Zhang Song 1,2,3 , Goto Takashi 1,2
Affiliations
1 State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology 1 , Wuhan 430070,
2 Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory 2 , Chaozhou 521000,
3 Hubei Longzhong Laboratory 3 , Xiangyang 441000,
4 School of Civil Engineering and Architecture, Wuhan University of Technology 4 , Wuhan 430070,
5 Nikolaev Institute of Inorganic Chemistry, Russian Academy of Sciences Siberian Branch 5 , Novosibirsk 630090,
Cite: Tu R. , Liang X. , Xu Q. , Ji B. , Li Q. , Zhang C. , Kosinova M.L. , Zhang S. , Goto T.
Computational fluid dynamics simulation of dual-showerhead configuration: Key to uniform large-scale chemical vapor deposition SiC coatings
Journal of Vacuum Science & Technology A. 2025. V.43. N6. 063410 . DOI: 10.1116/6.0004837 WOS Scopus OpenAlex
Dates:
Submitted: Jul 9, 2025
Published print: Nov 30, 2025
Identifiers:
Web of science: WOS:001602858400001
Scopus: 2-s2.0-105023831176
OpenAlex: W4415584031
Citing: Пока нет цитирований
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