Computational fluid dynamics simulation of dual-showerhead configuration: Key to uniform large-scale chemical vapor deposition SiC coatings

Computational fluid dynamics simulation of dual-showerhead configuration: Key to uniform large-scale chemical vapor deposition SiC coatings Научная публикация

Журнал

Journal of Vacuum Science & Technology A
ISSN: 0734-2101 , E-ISSN: 1520-8559

Вых. Данные

Год: 2025, Том: 43, Номер: 6, Номер статьи : 063410, Страниц : DOI: 10.1116/6.0004837

Авторы

Tu Rong ^1,2,3 , Liang Xin ¹ , Xu Qingfang ¹ , Ji Baifeng ⁴ , Li Qizhong ¹ , Zhang Chitengfei ³ , Kosinova Marina L. ⁵ , Zhang Song ^1,2,3 , Goto Takashi ^1,2

Организации

1	State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology 1 , Wuhan 430070,
2	Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory 2 , Chaozhou 521000,
3	Hubei Longzhong Laboratory 3 , Xiangyang 441000,
4	School of Civil Engineering and Architecture, Wuhan University of Technology 4 , Wuhan 430070,
5	Nikolaev Institute of Inorganic Chemistry, Russian Academy of Sciences Siberian Branch 5 , Novosibirsk 630090,

Tu R. , Liang X. , Xu Q. , Ji B. , Li Q. , Zhang C. , Kosinova M.L. , Zhang S. , Goto T.
Computational fluid dynamics simulation of dual-showerhead configuration: Key to uniform large-scale chemical vapor deposition SiC coatings
Journal of Vacuum Science & Technology A. 2025. V.43. N6. 063410 . DOI: 10.1116/6.0004837 WOS Scopus OpenAlex

Поступила в редакцию:	9 июл. 2025 г.
Опубликована в печати:	30 нояб. 2025 г.

Web of science:	WOS:001602858400001
Scopus:	2-s2.0-105023831176
OpenAlex:	W4415584031

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