Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor Full article

Journal

Thin Solid Films
ISSN: 1879-2731 , E-ISSN: 0040-6090

Output data

Year: 2014, Volume: 558, Pages: 112-117 Pages count : 6 DOI: 10.1016/j.tsf.2014.02.082

Authors

Sulyaeva Veronica S. ¹ , Kosinova Marina L. ¹ , Rumyantsev Yurii M. ¹ , Kuznetsov Fedor A. ¹ , Kesler Valerii G. ² , Kirienko Viktor V. ³

Affiliations

1	Department of Functional Materials Chemistry, Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090, Russia
2	Laboratory of Physical Principles for Integrated Microelectronics, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090, Russia
3	Laboratory of Nonequilibrium Semiconductors Systems, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090, Russia

Sulyaeva V.S. , Kosinova M.L. , Rumyantsev Y.M. , Kuznetsov F.A. , Kesler V.G. , Kirienko V.V.
Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor
Thin Solid Films. 2014. V.558. P.112-117. DOI: 10.1016/j.tsf.2014.02.082 WOS Scopus РИНЦ OpenAlex

Submitted:	Jun 22, 2013
Accepted:	Feb 28, 2014
Published online:	Mar 11, 2014

Web of science:	WOS:000334314100016
Scopus:	2-s2.0-84898821998
Elibrary:	21872870
OpenAlex:	W1968390150

DB	Citing
OpenAlex	17
Web of science	16
Scopus	17