Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor Научная публикация

Журнал

Thin Solid Films
ISSN: 1879-2731 , E-ISSN: 0040-6090

Вых. Данные

Год: 2014, Том: 558, Страницы: 112-117 Страниц : 6 DOI: 10.1016/j.tsf.2014.02.082

Авторы

Sulyaeva Veronica S. ¹ , Kosinova Marina L. ¹ , Rumyantsev Yurii M. ¹ , Kuznetsov Fedor A. ¹ , Kesler Valerii G. ² , Kirienko Viktor V. ³

Организации

1	Department of Functional Materials Chemistry, Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090, Russia
2	Laboratory of Physical Principles for Integrated Microelectronics, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090, Russia
3	Laboratory of Nonequilibrium Semiconductors Systems, Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090, Russia

Sulyaeva V.S. , Kosinova M.L. , Rumyantsev Y.M. , Kuznetsov F.A. , Kesler V.G. , Kirienko V.V.
Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor
Thin Solid Films. 2014. V.558. P.112-117. DOI: 10.1016/j.tsf.2014.02.082 WOS Scopus РИНЦ OpenAlex

Поступила в редакцию:	22 июн. 2013 г.
Принята к публикации:	28 февр. 2014 г.
Опубликована online:	11 мар. 2014 г.

Web of science:	WOS:000334314100016
Scopus:	2-s2.0-84898821998
РИНЦ:	21872870
OpenAlex:	W1968390150

БД	Цитирований
OpenAlex	18
Web of science	17
Scopus	17