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Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition Full article

Journal Journal of Physics D: Applied Physics
ISSN: 1361-6463
Output data Year: 2018, Volume: 51, Number: 25, Article number : 255307, Pages count : 7 DOI: 10.1088/1361-6463/aac641
Authors Starinskiy Sergey V 1,2 , Bulgakov Alexander V 1,3 , Gatapova Elizaveta Ya 1,2 , Shukhov Yuri G 1 , Sulyaeva Veronica S 4 , Timoshenko Nikolay I 1 , Safonov Alexey I 1
Affiliations
1 Kutateladze Institute of Thermophysics SB RAS, Lavrentyev Ave. 1, 630090, Novosibirsk, Russia
2 Novosibirsk State University, Pirogova Str. 2, 630090, Novosibirsk, Russia
3 HiLASE Centre, Institute of Physics of the Czech Academy of Sciences, Za Radnicí 828, 25241 Dolní Břežany, Czech Republic
4 Nikolaev Institute of Inorganic Chemistry SB RAS, Lavrentyev Ave. 3, 630090, Novosibirsk, Russia
Cite: Starinskiy S.V. , Bulgakov A.V. , Gatapova E.Y. , Shukhov Y.G. , Sulyaeva V.S. , Timoshenko N.I. , Safonov A.I.
Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition
Journal of Physics D: Applied Physics. 2018. V.51. N25. 255307 :1-7. DOI: 10.1088/1361-6463/aac641 WOS Scopus РИНЦ OpenAlex
Dates:
Submitted: Feb 27, 2018
Accepted: May 18, 2018
Published print: Jun 5, 2018
Identifiers:
Web of science: WOS:000434376000001
Scopus: 2-s2.0-85048306364
Elibrary: 35779107
OpenAlex: W2803700124
Citing:
DB Citing
OpenAlex 24
Web of science 22
Scopus 21
Elibrary 23
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