Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition Full article
Journal |
Journal of Physics D: Applied Physics
ISSN: 1361-6463 |
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Output data | Year: 2018, Volume: 51, Number: 25, Article number : 255307, Pages count : 7 DOI: 10.1088/1361-6463/aac641 | ||||||||
Authors |
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Affiliations |
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Cite:
Starinskiy S.V.
, Bulgakov A.V.
, Gatapova E.Y.
, Shukhov Y.G.
, Sulyaeva V.S.
, Timoshenko N.I.
, Safonov A.I.
Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition
Journal of Physics D: Applied Physics. 2018. V.51. N25. 255307 :1-7. DOI: 10.1088/1361-6463/aac641 WOS Scopus РИНЦ OpenAlex
Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition
Journal of Physics D: Applied Physics. 2018. V.51. N25. 255307 :1-7. DOI: 10.1088/1361-6463/aac641 WOS Scopus РИНЦ OpenAlex
Dates:
Submitted: | Feb 27, 2018 |
Accepted: | May 18, 2018 |
Published print: | Jun 5, 2018 |
Identifiers:
Web of science: | WOS:000434376000001 |
Scopus: | 2-s2.0-85048306364 |
Elibrary: | 35779107 |
OpenAlex: | W2803700124 |