Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition

Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition Научная публикация

Журнал

Journal of Physics D: Applied Physics
ISSN: 1361-6463

Вых. Данные

Год: 2018, Том: 51, Номер: 25, Номер статьи : 255307, Страниц : 7 DOI: 10.1088/1361-6463/aac641

Авторы

Starinskiy Sergey V ^1,2 , Bulgakov Alexander V ^1,3 , Gatapova Elizaveta Ya ^1,2 , Shukhov Yuri G ¹ , Sulyaeva Veronica S ⁴ , Timoshenko Nikolay I ¹ , Safonov Alexey I ¹

Организации

1	Kutateladze Institute of Thermophysics SB RAS, Lavrentyev Ave. 1, 630090, Novosibirsk, Russia
2	Novosibirsk State University, Pirogova Str. 2, 630090, Novosibirsk, Russia
3	HiLASE Centre, Institute of Physics of the Czech Academy of Sciences, Za Radnicí 828, 25241 Dolní Břežany, Czech Republic
4	Nikolaev Institute of Inorganic Chemistry SB RAS, Lavrentyev Ave. 3, 630090, Novosibirsk, Russia

Starinskiy S.V. , Bulgakov A.V. , Gatapova E.Y. , Shukhov Y.G. , Sulyaeva V.S. , Timoshenko N.I. , Safonov A.I.
Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition
Journal of Physics D: Applied Physics. 2018. V.51. N25. 255307 :1-7. DOI: 10.1088/1361-6463/aac641 WOS Scopus РИНЦ OpenAlex

Поступила в редакцию:	27 февр. 2018 г.
Принята к публикации:	18 мая 2018 г.
Опубликована в печати:	5 июн. 2018 г.

Web of science:	WOS:000434376000001
Scopus:	2-s2.0-85048306364
РИНЦ:	35779107
OpenAlex:	W2803700124

БД	Цитирований
OpenAlex	25
Web of science	22
Scopus	21
РИНЦ	25