Room-Temperature Formation of Hard BCx Films by Low Power Magnetron Sputtering Full article
Journal |
Applied sciences
ISSN: 2076-3417 |
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Output data | Year: 2021, Volume: 11, Number: 21, Article number : 9896, Pages count : 14 DOI: 10.3390/app11219896 | ||||
Authors |
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Affiliations |
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Cite:
Sulyaeva V.
, Khomyakov M.
, Kosinova M.
Room-Temperature Formation of Hard BCx Films by Low Power Magnetron Sputtering
Applied sciences. 2021. V.11. N21. 9896 :1-14. DOI: 10.3390/app11219896 WOS Scopus РИНЦ OpenAlex
Room-Temperature Formation of Hard BCx Films by Low Power Magnetron Sputtering
Applied sciences. 2021. V.11. N21. 9896 :1-14. DOI: 10.3390/app11219896 WOS Scopus РИНЦ OpenAlex
Identifiers:
Web of science: | WOS:000719374700001 |
Scopus: | 2-s2.0-85117615664 |
Elibrary: | 47515950 |
OpenAlex: | W3210486342 |