Room-Temperature Formation of Hard BCx Films by Low Power Magnetron Sputtering

Журнал

Applied sciences
ISSN: 2076-3417

Вых. Данные

Год: 2021, Том: 11, Номер: 21, Номер статьи : 9896, Страниц : 14 DOI: 10.3390/app11219896

Авторы

Sulyaeva Veronica ¹ , Khomyakov Maxim ² , Kosinova Marina ¹

Организации

1	Department of Chemistry of Functional Materials, Nikolaev Institute of Inorganic Chemistry Siberian Branch, Russian Academy of Sciences
2	Laser Plasma Department, Institute of Laser Physics SB RAS

Sulyaeva V. , Khomyakov M. , Kosinova M.
Room-Temperature Formation of Hard BCx Films by Low Power Magnetron Sputtering
Applied sciences. 2021. V.11. N21. 9896 :1-14. DOI: 10.3390/app11219896 WOS Scopus РИНЦ OpenAlex