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ALD and CVD deposition of pure thin gold films from a stable dimethylgold(III) precursor Full article

Journal Nanoscale
ISSN: 2040-3372 , E-ISSN: 2040-3364
Output data Year: 2025, Volume: 17, Number: 4, Pages: 2318-2325 Pages count : 8 DOI: 10.1039/d4nr04765f
Authors Parkhomenko Roman G. 1 , Igumenov Igor K. 2 , Hadjadj Sebastien Elie 3 , Trubin Sergey V. 2 , Knez Mato 1,4
Affiliations
1 CIC NanoGUNE, Tolosa Hiribidea 76, E-20018 San Sebastian, Spain. r.parkhomenko@nanogune.eu.
2 Nikolaev Institute of Inorganic Chemistry SB RAS, Lavrentiev Pr. 3, Novosibirsk 630090, Russia.
3 Materials Physics Center CSIC - UPV/EHU, Manuel de Lardizabal 5, 20018 San Sebastián, Spain.
4 IKERBASQUE, Basque Foundation for Science, Plaza Euskadi 3, Bilbao E-48009, Spain.
Cite: Parkhomenko R.G. , Igumenov I.K. , Hadjadj S.E. , Trubin S.V. , Knez M.
ALD and CVD deposition of pure thin gold films from a stable dimethylgold(III) precursor
Nanoscale. 2025. V.17. N4. P.2318-2325. DOI: 10.1039/d4nr04765f WOS OpenAlex
Dates:
Published print: Jan 28, 2025
Identifiers:
Web of science: WOS:001378730100001
OpenAlex: W4405072492
Citing: Пока нет цитирований
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