Thermodynamic Modeling of the Deposition of Nickel-Containing Films from the Gas Phase

Thermodynamic Modeling of the Deposition of Nickel-Containing Films from the Gas Phase Full article

Journal

Russian Journal of Physical Chemistry A
ISSN: 0036-0244 , E-ISSN: 1531-863X

Output data

Year: 2024, Volume: 98, Number: 9, Pages: 2007-2011 Pages count : 5 DOI: 10.1134/S0036024424701140

Tags

thermodynamic modeling, CVD diagrams, Ni–O–C–H–(Ar) system, NiO films

Authors

Shestakov V.A. ¹ , Kosinova M.L. ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Thermodynamic modeling of vapor deposition in the Ni–O–C–H–(Ar) system was performed at temperatures of 100–800°C and a pressure of 0.1 Torr. The process for the production of nickel-containing films from a mixture of nickelocene or nickel acetylacetonate with oxygen and argon (as a carrier gas) by vapor deposition was modeled. The corresponding CVD diagrams were constructed. The possibility of using such mixtures for producing composite films of different compositions was shown. The dependence of the content of individual phases was studied. The formation of Ni + C and Ni + NiO phase complexes, as well as individual Ni and NiO phases, can be expected in these systems under appropriate conditions. It was established that the graphite-containing complex forms in the range of relatively low temperatures. The ranges of conditions for the formation of phases and phase complexes based on the mixtures were determined.

Shestakov V.A. , Kosinova M.L.
Thermodynamic Modeling of the Deposition of Nickel-Containing Films from the Gas Phase
Russian Journal of Physical Chemistry A. 2024. V.98. N9. P.2007-2011. DOI: 10.1134/S0036024424701140 WOS Scopus РИНЦ OpenAlex

Submitted:	Dec 6, 2023
Accepted:	Dec 21, 2023
Published print:	Sep 1, 2024

Web of science:	WOS:001309536300021
Scopus:	2-s2.0-85203321200
Elibrary:	69169422
OpenAlex:	W4402355373

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