MOCVD growth and characterization of vanadium dioxide films

MOCVD growth and characterization of vanadium dioxide films Full article

Journal

Journal of Materials Science
ISSN: 1573-4803 , E-ISSN: 0022-2461

Output data

Year: 2017, Volume: 52, Number: 7, Pages: 4061-4069 Pages count : 9 DOI: 10.1007/s10853-016-0669-y

Authors

Yakovkina L.V. ¹ , Mutilin S.V. ² , Prinz V.Ya. ² , Smirnova T.P. ¹ , Shayapov V.R. ¹ , Korol’kov I.V. ¹ , Maksimovsky E.A.Maksimovsky ¹ , Volchok N.D. ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences
2	Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences

Yakovkina L.V. , Mutilin S.V. , Prinz V.Y. , Smirnova T.P. , Shayapov V.R. , Korol’kov I.V. , Maksimovsky E.A.M. , Volchok N.D.
MOCVD growth and characterization of vanadium dioxide films
Journal of Materials Science. 2017. V.52. N7. P.4061-4069. DOI: 10.1007/s10853-016-0669-y WOS Scopus РИНЦ OpenAlex

Submitted:	Oct 19, 2016
Published online:	Dec 27, 2016

Web of science:	WOS:000392500200043
Scopus:	2-s2.0-85007432912
Elibrary:	29469641
OpenAlex:	W2562603248

DB	Citing
OpenAlex	32
Scopus	29
Web of science	19
Elibrary	34