INFLUENCE OF CURRENT DENSITY ON THE STRUCTURE OF AMORPHOUS SILICON SUBOXIDE THIN FILMS UNDER ELECTRON-BEAM ANNEALING

INFLUENCE OF CURRENT DENSITY ON THE STRUCTURE OF AMORPHOUS SILICON SUBOXIDE THIN FILMS UNDER ELECTRON-BEAM ANNEALING Full article

Journal

Journal of Applied Mechanics and Technical Physics
ISSN: 1573-8620 , E-ISSN: 0021-8944

Output data

Year: 2023, Volume: 64, Number: 5, Pages: 778-783 Pages count : 6 DOI: 10.1134/s0021894423050061

Authors

Baranov E.A. ¹ , Nepomnyashchikh V.A. ^1,2 , Konstantinov V.O. ¹ , Shchukin V.G. ¹ , Merkulova I.E. ¹ , Zamchiy A.O. ¹ , Lunev N.A. ^1,2 , Volodin V.A. ^2,3 , Shapovalova A.A. ⁴

Affiliations

1	Kutateladze Institute of Thermophysics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
2	Novosibirsk State University, Novosibirsk, Russia
3	Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
4	Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia

Baranov E.A. , Nepomnyashchikh V.A. , Konstantinov V.O. , Shchukin V.G. , Merkulova I.E. , Zamchiy A.O. , Lunev N.A. , Volodin V.A. , Shapovalova A.A.
INFLUENCE OF CURRENT DENSITY ON THE STRUCTURE OF AMORPHOUS SILICON SUBOXIDE THIN FILMS UNDER ELECTRON-BEAM ANNEALING
Journal of Applied Mechanics and Technical Physics. 2023. V.64. N5. P.778-783. DOI: 10.1134/s0021894423050061 WOS Scopus РИНЦ OpenAlex

Баранов Е. , Непомнящих В. , Константинов В. , Щукин В. , Меркулова И. , Замчий А. , Лунев Н. , Володин В. , Шаповалова А.А.
Влияние плотности тока на структуру тонких пленок аморфного субоксида кремния при электронно-пучковом отжиге
Прикладная механика и техническая физика. 2023. DOI: 10.15372/PMTF202315332м

Published print:

Sep 17, 2023

Web of science:	WOS:001142921400016
Scopus:	2-s2.0-85182479214
Elibrary:	65550620
OpenAlex:	W4390871297

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