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Properties of BCxNy films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures Full article

Journal Inorganic Materials
ISSN: 0020-1685 , E-ISSN: 1608-3172
Output data Year: 2010, Volume: 46, Number: 5, Pages: 487-494 Pages count : 8 DOI: 10.1134/s0020168510050092
Authors Sulyaeva V.S. 1 , Kosinova M.L. 1 , Rumyantsev Yu.M. 1 , Golubenko A.N. 2 , Fainer N.I. 1 , Alferova N.I. 1 , Ayupov B.M. 1 , Gevko P.N. 1 , Kesler V.G. 3 , Kolesov B.A. 1 , Maksimovskii E.A. 1 , Myakishev K.G. 1 , Yushina I.V. 1 , Kuznetsov F.A. 1
Affiliations
1 Nikolaev Institute of Inorganic Chemistry, Siberian Division, Russian Academy of Sciences, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090 Russia
2 Novosibirsk State University, ul. Pirogova 2, Novosibirsk, 630090 Russia
3 Institute of Semiconductor Physics, Siberian Division, Russian Academy of Sciences, pr. Akademika Lavrent’eva 13, Novosibirsk, 630090 Russia
Cite: Sulyaeva V.S. , Kosinova M.L. , Rumyantsev Y.M. , Golubenko A.N. , Fainer N.I. , Alferova N.I. , Ayupov B.M. , Gevko P.N. , Kesler V.G. , Kolesov B.A. , Maksimovskii E.A. , Myakishev K.G. , Yushina I.V. , Kuznetsov F.A.
Properties of BCxNy films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures
Inorganic Materials. 2010. V.46. N5. P.487-494. DOI: 10.1134/s0020168510050092 WOS Scopus РИНЦ OpenAlex
Dates:
Submitted: Feb 19, 2009
Published print: May 1, 2010
Identifiers:
Web of science: WOS:000277428000009
Scopus: 2-s2.0-77952220209
Elibrary: 15315648
OpenAlex: W2467132109
Citing:
DB Citing
OpenAlex 12
Web of science 10
Scopus 9
Elibrary 8
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