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Low-power resistive switching in a two-terminal VO2 mesostructures Full article

Journal Physica B-condensed Matter
ISSN: 1873-2135 , E-ISSN: 0921-4526
Output data Year: 2025, Volume: 716, Article number : 417765, Pages count : 6 DOI: 10.1016/j.physb.2025.417765
Tags Vanadium dioxideTwo-terminal resistive switchesMesostructureThreshold power
Authors Kapoguzov K.E. 1,2 , Milyushin D.M. 1,2 , Tumashev V.S. 1 , Bagochus E.K. 1 , Kichay V.N. 3 , Yakovkina L.V. 3 , Mutilin S.V. 1
Affiliations
1 Rzhanov Institute of Semiconductor Physics SB RAS
2 Novosibirsk State University
3 Nikolaev Institute of Inorganic Chemistry SB RAS

Abstract: Vanadium dioxide (VO2) is a promising material for high-speed, energy-efficient nanoelectronic and nanophotonic devices due to its semiconductor–metal phase transition. In this study, we investigated resistive switching in a VO2 mesostructures with varying contact widths. We showed that mesostructure formation significantly reduces the current flow area, heat dissipation and enhances the switching ratio compared to a solid film. At a contact width of 3 μm, the current jumped by ∼400 times, an order of magnitude greater than in the solid-film device, while the threshold switching power was ∼0.78 mW, also an order of magnitude lower. Moreover, reducing contact width in solid films caused current spreading over an area 2–10 times wider than the contact width, leading to unwanted thermal crosstalk in potential dense neuromorphic systems. We proposed mesostructure with contact widths less than 10 μm as an efficient approach to improving switching localization.
Cite: Kapoguzov K.E. , Milyushin D.M. , Tumashev V.S. , Bagochus E.K. , Kichay V.N. , Yakovkina L.V. , Mutilin S.V.
Low-power resistive switching in a two-terminal VO2 mesostructures
Physica B-condensed Matter. 2025. V.716. 417765 :1-6. DOI: 10.1016/j.physb.2025.417765 WOS OpenAlex
Dates:
Submitted: Jun 19, 2025
Accepted: Aug 31, 2025
Published online: Sep 1, 2025
Published print: Nov 1, 2025
Identifiers:
Web of science: WOS:001568066600003
OpenAlex: W4413870424
Citing: Пока нет цитирований
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