Thin Films of Tungsten Disulﬁde Grown by Sulfurization of Sputtered Metal for Ultra-Low Detection of Nitrogen Dioxide Gas

Thin Films of Tungsten Disulﬁde Grown by Sulfurization of Sputtered Metal for Ultra-Low Detection of Nitrogen Dioxide Gas Научная публикация

Журнал

Nanomaterials
ISSN: 2079-4991

Вых. Данные

Год: 2025, Том: 15, Номер: 8, Номер статьи : 594, Страниц : 19 DOI: 10.3390/nano15080594

Авторы

Fedorenko Anastasiya D. ¹ , Lavrukhina Svetlana A. ¹ , Alekseev Victor A. ¹ , Sysoev Vitalii I. ¹ , Sulyaeva Veronica S. ¹ , Okotrub Alexander V. ¹ , Bulusheva Lyubov G. ¹

Организации

1	Nikolaev Institute of Inorganic Chemistry SB RAS, 3 Acad. Lavrentiev Ave., 630090 Novosibirsk, Russia

Fedorenko A.D. , Lavrukhina S.A. , Alekseev V.A. , Sysoev V.I. , Sulyaeva V.S. , Okotrub A.V. , Bulusheva L.G.
Thin Films of Tungsten Disulﬁde Grown by Sulfurization of Sputtered Metal for Ultra-Low Detection of Nitrogen Dioxide Gas
Nanomaterials. 2025. V.15. N8. 594 :1-19. DOI: 10.3390/nano15080594 OpenAlex

Опубликована в печати:	12 апр. 2025 г.
Опубликована online:	12 апр. 2025 г.

OpenAlex:

W4409432096

Пока нет цитирований