Engineering structure and functionalities of chemical vapor deposited photocatalytic titanium dioxide films through different types of precursors

Engineering structure and functionalities of chemical vapor deposited photocatalytic titanium dioxide films through different types of precursors Научная публикация

Журнал

CrystEngComm
ISSN: 1466-8033

Вых. Данные

Год: 2021, Том: 23, Страницы: 3681-3692 Страниц : 12 DOI: 10.1039/d1ce00081k

Авторы

Samélor Diane ¹ , Turgambaeva Asiya ² , Krisyuk Vladislav ² , Miquelot Adeline ¹ , Jeremy Cure ³ , Sysoev Sergey ² , Trubin Sergey ² , Stabnikov Pavel ² , Esvan Jérôme ¹ , Constandoudis Vassilios ⁴ , Vahlas Constantin ¹

Организации

1	CIRIMAT-CNRS
2	Nikolaev Institute of Inorganic Chemistry SB RAS
3	LAAS-CNRS, Avenue du Colonel Roche, 31031 Toulouse, France
4	Nanometrisis, TEPA Lefkippos, Patriarchou Grigoriou & Neapoleos 27, PO Box 60037, Agia Paraskevi 15341, Greece

Samélor D. , Turgambaeva A. , Krisyuk V. , Miquelot A. , Jeremy C. , Sysoev S. , Trubin S. , Stabnikov P. , Esvan J. , Constandoudis V. , Vahlas C.
Engineering structure and functionalities of chemical vapor deposited photocatalytic titanium dioxide films through different types of precursors
CrystEngComm. 2021. V.23. P.3681-3692. DOI: 10.1039/d1ce00081k WOS OpenAlex

Web of science:	WOS:000643907200001
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