Silver CVD and ALD Precursors: Synthesis, Properties, and Application in Deposition Processes

Silver CVD and ALD Precursors: Synthesis, Properties, and Application in Deposition Processes Review

Journal

Molecules
ISSN: 1420-3049

Output data

Year: 2024, Volume: 29, Article number : 5705, Pages count : 43 DOI: 10.3390/molecules29235705

Authors

Vikulova E.S. ¹ , Dorovskikh S.I. ¹ , Basova T.V. ¹ , Zheravin A.A. ² , Morozova N.B. ¹

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
2	Meshalkin National Medical Research Center, Ministry of Public Health of the Russian Federation

This review summarized the developments in the field of volatile silver complexes, which can serve as precursors in gas-transport reactions for the production of thin films and metal nanoparticles via chemical vapor deposition (CVD) and atomic layer deposition (ALD). Silver-based films and nanoparticles are widely used in various high-tech fields, including medicine. For effective use in CVD and ALD processes, the properties of silver precursors must be balanced in terms of volatility, thermal stability, and reactivity. In this review, we focus on the synthesis and comprehensive analysis of structural and thermal characteristics for the most promising classes of volatile silver complexes, as well as organometallic compounds. Following the specifics of silver chemistry, some features of the use of precursors and their selection, as well as several key directions to improving the efficiency of silver material deposition processes, are also discussed.

Vikulova E.S. , Dorovskikh S.I. , Basova T.V. , Zheravin A.A. , Morozova N.B.
Silver CVD and ALD Precursors: Synthesis, Properties, and Application in Deposition Processes
Molecules. 2024. V.29. 5705 :1-43. DOI: 10.3390/molecules29235705 WOS Scopus OpenAlex

Published print:

Dec 1, 2024

Web of science:	WOS:001376392200001
Scopus:	2-s2.0-85211937223
OpenAlex:	W4404960573

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