High-speed deposition of silicon nitride thick films via halide laser chemical vapor deposition

High-speed deposition of silicon nitride thick films via halide laser chemical vapor deposition Научная публикация

Журнал

Journal of The European Ceramic Society
ISSN: 0955-2219 , E-ISSN: 1873-619X

Вых. Данные

Год: 2023, Том: 43, Номер: 12, Страницы: 5214-5222 Страниц : 9 DOI: 10.1016/j.jeurceramsoc.2023.04.035

Авторы

Tu Rong ^1,2,3 , Liu Zhen ¹ , Xu Qifeng ¹ , Zhang Song ¹ , Li Qizhong ¹ , Zhang Xian ³ , Kosinova Marina L. ⁴ , Goto Takashi ^1,5

Организации

1	State Key Lab of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
2	Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory, Chaozhou 521000, China
3	Wuhan University of Technology Advanced Engineering Technology Research Institute of Zhongshan City, Zhongshan 528400, China
4	Nikolaev Institute of Inorganic Chemistry, Russian Academy of Sciences Siberian Branch, 3 Acad. Lavrerntiev Pr., Novosibirsk 630090, Russia
5	New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan

Tu R. , Liu Z. , Xu Q. , Zhang S. , Li Q. , Zhang X. , Kosinova M.L. , Goto T.
High-speed deposition of silicon nitride thick films via halide laser chemical vapor deposition
Journal of The European Ceramic Society. 2023. V.43. N12. P.5214-5222. DOI: 10.1016/j.jeurceramsoc.2023.04.035 WOS Scopus OpenAlex

Поступила в редакцию:	11 февр. 2023 г.
Опубликована в печати:	1 сент. 2023 г.

Web of science:	WOS:001010470800001
Scopus:	2-s2.0-85153872066
OpenAlex:	W4366245900

БД	Цитирований
OpenAlex	3
Web of science	3
Scopus	3