Formation of SnO and SnO2 phases during the annealing of SnO(x) films obtained by molecular beam epitaxy

Formation of SnO and SnO2 phases during the annealing of SnO(x) films obtained by molecular beam epitaxy Научная публикация

Журнал

Applied Surface Science
ISSN: 1873-5584 , E-ISSN: 0169-4332

Вых. Данные

Год: 2020, Том: 512, Номер статьи : 145735, Страниц : DOI: 10.1016/j.apsusc.2020.145735

Авторы

Nikiforov Alexander ^1,2 , Timofeev Vyacheslav ¹ , Mashanov Vladimir ¹ , Azarov Ivan ^1,5 , Loshkarev Ivan ¹ , Volodin Vladimir ^1,5 , Gulyaev Dmitry ¹ , Chetyrin Igor ³ , Korolkov Ilya ^5,4

Организации

1	A.V. Rzhanov Institute of Semiconductor Physics SB RAS, 13 Lavrentyev Avenue, Novosibirsk 630090, Russia
2	National Research Tomsk State University, 36 Lenin Avenue, Tomsk 634050, Russia
3	Boreskov Institute of Catalysis SB RAS, 5 Lavrentyev Avenue, Novosibirsk 630090, Russia
4	Nikolaev Institute of Inorganic Chemistry SB RAS, 3 Lavrentyev Avenue, Novosibirsk 630090, Russia
5	Novosibirsk State University, 1 Pirogov str., Novosibirsk 630090, Russia

Nikiforov A. , Timofeev V. , Mashanov V. , Azarov I. , Loshkarev I. , Volodin V. , Gulyaev D. , Chetyrin I. , Korolkov I.
Formation of SnO and SnO2 phases during the annealing of SnO(x) films obtained by molecular beam epitaxy
Applied Surface Science. 2020. V.512. 145735 . DOI: 10.1016/j.apsusc.2020.145735 WOS Scopus РИНЦ OpenAlex

Web of science:	WOS:000522731700099
Scopus:	2-s2.0-85079325375
РИНЦ:	43239835
OpenAlex:	W3006599483

БД	Цитирований
OpenAlex	69
Scopus	46
Web of science	57
РИНЦ	43